Proceedings of the 1999 7th International Symposium on Physical and Failure Analysis of Integrated Circuits; Singapore, Singapore; 5 July 1999 through 9 July 1999; Code 56210
Long Term Noise Measurements to Characterize Electromigration in Metal Lines of ICs
CIOFI, Carmine;
1999-01-01
Abstract
Proceedings of the 1999 7th International Symposium on Physical and Failure Analysis of Integrated Circuits; Singapore, Singapore; 5 July 1999 through 9 July 1999; Code 56210File in questo prodotto:
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