In this paper we describe an analytical model for the gate current 1/f noise in a MOS device. The model is based on a simple idea: one electron trapped in the dielectric switches-off tunneling through the oxide over an equivalent blocking area. The effective trap density inside the dielectric can be extracted as a function of energy from gate current noise measurements. The Gate Noise Parameter (GNP) is introduced as a new figure of merit for the quality of the gate stack. The GNP can be related to physical quantities of the MOS structure on the basis of the proposed model. © 2008 IEEE.

A model for MOS gate stack quality evaluation based on the gate current 1/f noise

GIUSI, Gino;
2008-01-01

Abstract

In this paper we describe an analytical model for the gate current 1/f noise in a MOS device. The model is based on a simple idea: one electron trapped in the dielectric switches-off tunneling through the oxide over an equivalent blocking area. The effective trap density inside the dielectric can be extracted as a function of energy from gate current noise measurements. The Gate Noise Parameter (GNP) is introduced as a new figure of merit for the quality of the gate stack. The GNP can be related to physical quantities of the MOS structure on the basis of the proposed model. © 2008 IEEE.
2008
9781424417308
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11570/2749598
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