This paper focuses on the equivalent-circuit modelling of gallium-nitride (GaN) high electron-mobility transistors (HEMTs) on silicon carbide (SiC) substrate. The model is extracted from scattering (S-) parameters measurements by using the well-known 'cold' approach. The extracted model is successfully validated by investigating three devices with different gate widths in a wide range of bias points over a broad frequency range spanning from 45 MHz up to 50 GHz.

GaN HEMT Modeling versus Bias Point and Gate Width

Crupi G.
Primo
;
Latino M.
Secondo
;
Gugliandolo G.;Fazio E.
Penultimo
;
Donato N.
Ultimo
2023-01-01

Abstract

This paper focuses on the equivalent-circuit modelling of gallium-nitride (GaN) high electron-mobility transistors (HEMTs) on silicon carbide (SiC) substrate. The model is extracted from scattering (S-) parameters measurements by using the well-known 'cold' approach. The extracted model is successfully validated by investigating three devices with different gate widths in a wide range of bias points over a broad frequency range spanning from 45 MHz up to 50 GHz.
2023
979-8-3503-1073-3
File in questo prodotto:
Non ci sono file associati a questo prodotto.
Pubblicazioni consigliate

I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.

Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11570/3270569
 Attenzione

Attenzione! I dati visualizzati non sono stati sottoposti a validazione da parte dell'ateneo

Citazioni
  • ???jsp.display-item.citation.pmc??? ND
  • Scopus 0
  • ???jsp.display-item.citation.isi??? 0
social impact