A new atomic layer deposition (ALD) process was applied for the homogeneous coating of carbon nanotubes with vanadium oxide. It permits the coating of the inner and outer surface with a highly conformal film of controllable thickness and, hence, the production of high surface area hybrid materials at a so far unprecedented quality. The ALD-coated tubes are used as active component in gas-sensing devices. They show electric responses that are directly related to the peculiar structure, i.e., the p-n heterojunction formed between the support and the film.
Titolo: | Vanadium oxide sensing layer grown on carbon nanotubes by a new atomic layer deposition process |
Autori: | |
Data di pubblicazione: | 2008 |
Rivista: | |
Abstract: | A new atomic layer deposition (ALD) process was applied for the homogeneous coating of carbon nanotubes with vanadium oxide. It permits the coating of the inner and outer surface with a highly conformal film of controllable thickness and, hence, the production of high surface area hybrid materials at a so far unprecedented quality. The ALD-coated tubes are used as active component in gas-sensing devices. They show electric responses that are directly related to the peculiar structure, i.e., the p-n heterojunction formed between the support and the film. |
Handle: | http://hdl.handle.net/11570/12180 |
Appare nelle tipologie: | 14.a.1 Articolo su rivista |
File in questo prodotto:
Non ci sono file associati a questo prodotto.
I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.