In this investigation, we report on a representative study that stands for an example of electronic and structural analyses by X-ray photoelectron spectroscopy of covalently assembled molecular monolayers. This technique was revealed as a potent apparatus to get information not available with many other instruments. Two covalently assembled monolayers of Rh2(form) 2(O2C-C6H4-OH)2 and Rh2(form)2(O2C-C4H 8-OH)2 (form ) N,N′-di-p-tolyl-formamidinate anion) molecules were fabricated on both Si(100) and silica substrates, already functionalized with a covalent 4-ClCH2C6H 4SiCl3 monolayer. Both structural and chemical characterizations were carried out by angle-resolved X-ray photoelectron measurements. Surface morphological characterization was performed by atomic force microscopy measurements. The present results provide information on the grafting of the dirhodium complexes and highlight the reliability of the photoelectronic technique.
X-ray photoelectron spectroscopy: a powerful tool for electronic and structural investigations of covalently assembled monolayers. A representative case study
LO SCHIAVO, Sandra
2009-01-01
Abstract
In this investigation, we report on a representative study that stands for an example of electronic and structural analyses by X-ray photoelectron spectroscopy of covalently assembled molecular monolayers. This technique was revealed as a potent apparatus to get information not available with many other instruments. Two covalently assembled monolayers of Rh2(form) 2(O2C-C6H4-OH)2 and Rh2(form)2(O2C-C4H 8-OH)2 (form ) N,N′-di-p-tolyl-formamidinate anion) molecules were fabricated on both Si(100) and silica substrates, already functionalized with a covalent 4-ClCH2C6H 4SiCl3 monolayer. Both structural and chemical characterizations were carried out by angle-resolved X-ray photoelectron measurements. Surface morphological characterization was performed by atomic force microscopy measurements. The present results provide information on the grafting of the dirhodium complexes and highlight the reliability of the photoelectronic technique.Pubblicazioni consigliate
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