Plasma Technologies in the Synthesis and Treatment of Nanostructured Metal Oxide Semiconductors for Gas Sensing: A Short Review

The review covers the main methods of growth/deposition/treatment of nanostructured metal oxides (MOX) films based on plasma-assisted technologies. Due to their noticeable semiconducting properties, metal oxides have been widely used as sensing layer in metal oxide semiconductor devices. Additionally, the nanostructure of the sensing material provides a valuable factor for enhancing the sensor performances. The technological and scientific background of main plasma-assisted technologies, as well as the most important results obtained in the growth/deposition/treatment of nanostructured metal oxides for application in gas sensing, will be here presented.