The effect of doping on the reflectance and on the imaginary part of the dielectric function in the UV-visible range was investigated for a series of hydrogenated amorphous silicon films. The samples, doped with phosphorus or boron, were prepared by a reactive evaporation technique. Doping, with either p- or n-type dopants, strongly affects the spectra causing both a red shift and a decrease in peak height. Analysis of the results in terms of the oscillator strength and the excitation energy indicates that there is a decrease in the short-range order which, according to the literature, is attributed to a degree of structural disorder induced by the dopants.

Optical properties of doped hydrogenated amorphous silicon films

GRASSO, Vincenzo;NERI, Fortunato
1986-01-01

Abstract

The effect of doping on the reflectance and on the imaginary part of the dielectric function in the UV-visible range was investigated for a series of hydrogenated amorphous silicon films. The samples, doped with phosphorus or boron, were prepared by a reactive evaporation technique. Doping, with either p- or n-type dopants, strongly affects the spectra causing both a red shift and a decrease in peak height. Analysis of the results in terms of the oscillator strength and the excitation energy indicates that there is a decrease in the short-range order which, according to the literature, is attributed to a degree of structural disorder induced by the dopants.
1986
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11570/2078232
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