We report on the results of noise measurements in p-type organic thin-film transistors (TFTs) extending from the subthreshold region into the strong accumulation region over four decades of drain current values. The low-frequency noise produced by the devices can be successfully interpreted in the context of a multitrap correlated number fluctuation - mobility fluctuation (CMF) theory, while neither phonon-induced mobility fluctuation nor carrier number fluctuation mechanisms are capable of justifying the observed noise behavior. The Coulomb scattering parameter is found to be in the order of 107 Vs/C, about three orders of magnitude larger with respect to crystalline silicon MOSFETs and comparable with what already reported in hydrogenated amorphous silicon TFTs, suggesting a much more relevant contribution coming from CMF in disordered materials.

Evidence of Correlated Mobility Fluctuations in p-Type Organic Thin-Film Transistors

GIUSI, Gino
Primo
;
GIORDANO, ORAZIO
Secondo
;
SCANDURRA, Graziella;CIOFI, Carmine
Ultimo
2015-01-01

Abstract

We report on the results of noise measurements in p-type organic thin-film transistors (TFTs) extending from the subthreshold region into the strong accumulation region over four decades of drain current values. The low-frequency noise produced by the devices can be successfully interpreted in the context of a multitrap correlated number fluctuation - mobility fluctuation (CMF) theory, while neither phonon-induced mobility fluctuation nor carrier number fluctuation mechanisms are capable of justifying the observed noise behavior. The Coulomb scattering parameter is found to be in the order of 107 Vs/C, about three orders of magnitude larger with respect to crystalline silicon MOSFETs and comparable with what already reported in hydrogenated amorphous silicon TFTs, suggesting a much more relevant contribution coming from CMF in disordered materials.
2015
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11570/3067088
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