This paper presents the results of the electrical characterization of a silicon Low Voltage Trench Gate charged-coupled Power MOSFET under external uniaxial mechanical stress. The stress was imposed by a 3 Point Bending system during electrical measurement of the oxide leakage current.

Electrical characterization of gate oxide current in a silicon power MOS subjected to uniaxial mechanical stress

Calabretta M.;
2020-01-01

Abstract

This paper presents the results of the electrical characterization of a silicon Low Voltage Trench Gate charged-coupled Power MOSFET under external uniaxial mechanical stress. The stress was imposed by a 3 Point Bending system during electrical measurement of the oxide leakage current.
File in questo prodotto:
Non ci sono file associati a questo prodotto.
Pubblicazioni consigliate

I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.

Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11570/3347376
 Attenzione

Attenzione! I dati visualizzati non sono stati sottoposti a validazione da parte dell'ateneo

Citazioni
  • ???jsp.display-item.citation.pmc??? ND
  • Scopus 0
  • ???jsp.display-item.citation.isi??? ND
social impact