CINECA IRIS Institutional Research Information System
IRIS è la soluzione IT che facilita la raccolta e la gestione dei dati relativi alle attività e ai prodotti della ricerca. Fornisce a ricercatori, amministratori e valutatori gli strumenti per monitorare i risultati della ricerca, aumentarne la visibilità e allocare in modo efficace le risorse disponibili.
EnglishOxidation tests carried out in supercritical water (400-500°C) revealed a noticeable corrosion attack on the silicon nitride surface in spite of the low temperatures. Increasing water pressure generally caused an increase in the oxidation phenomena. Oxidation scale evolution depended strictly on the silicon nitride sintering process, sintering aids, porosity and impurities, which influenced oxidation kinetics and surface morphology. In such test conditions the solubility of silica in water seemed to have a great influence on the stability of the oxidation scale, mainly in reactionbonded silicon nitride samples
| Titolo: | Low temperature oxidation of silicon nitride by water in supercritical condition |
| Autori: | |
| Data di pubblicazione: | 1996 |
| Rivista: | |
| Abstract: | Oxidation tests carried out in supercritical water (400-500°C) revealed a noticeable corrosion attack on the silicon nitride surface in spite of the low temperatures. Increasing water pressure generally caused an increase in the oxidation phenomena. Oxidation scale evolution depended strictly on the silicon nitride sintering process, sintering aids, porosity and impurities, which influenced oxidation kinetics and surface morphology. In such test conditions the solubility of silica in water seemed to have a great influence on the stability of the oxidation scale, mainly in reactionbonded silicon nitride samples |
| Handle: | http://hdl.handle.net/11570/603 |
| Appare nelle tipologie: | 14.a.1 Articolo su rivista |
File in questo prodotto:
http://hdl.handle.net/11570/603
Copyright © 2019