In this paper, a 3D process of a nanometric n-channel fin field-effect transistor (FinFET) is discussed and the impact of variations of the fin parameter, the gate work function, and doping concentration on device characteristics are studied using the ATLAS Silvaco device simulator. Simulation results for various gate lengths are reported and analyzed. As the quantum effects are pronounced in nanoscale devices, we have included these effects in our study and simulation. We have then compared the achieved results to classical simulations to assess their performance limits. Finally, a comparison of our results with recently published data is presented to confirm our study.
Investigation on TG n-FinFET Parameters by Varying Channel Doping Concentration and Gate Length
Boukortt, N.;Patanè, S.;Caddemi, A.;Crupi, G.
2017-01-01
Abstract
In this paper, a 3D process of a nanometric n-channel fin field-effect transistor (FinFET) is discussed and the impact of variations of the fin parameter, the gate work function, and doping concentration on device characteristics are studied using the ATLAS Silvaco device simulator. Simulation results for various gate lengths are reported and analyzed. As the quantum effects are pronounced in nanoscale devices, we have included these effects in our study and simulation. We have then compared the achieved results to classical simulations to assess their performance limits. Finally, a comparison of our results with recently published data is presented to confirm our study.Pubblicazioni consigliate
I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.
